Electron confinement and optical enhancement in Si/SiO2 superlattices -: art. no. 195330

被引:19
作者
Carrier, P
Lewis, LJ
Dharma-Wardana, MWC
机构
[1] Univ Montreal, Dept Phys, Montreal, PQ H3C 3J7, Canada
[2] Univ Montreal, Grp Rech Phys & Technol Couches Minces, Montreal, PQ H3C 3J7, Canada
[3] Natl Res Council Canada, Inst Microstruct Sci, Ottawa, ON K1A 0R6, Canada
关键词
D O I
10.1103/PhysRevB.64.195330
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have performed first-principles calculations of Si/SiO2 superlattices in order to examine their electronic states, confinement, and optical transitions, using linearized-augmented-plane-wave techniques and density-functional theory. Two atomic models having fairly simple interface structure are considered. They differ in the way dangling bonds at interfaces are satisfied. The real and imaginary parts of the dielectric function are calculated at the Fermi-golden-rule level and used to estimate the absorption coefficients. Confinement is demonstrated by the dispersionless character of the electronic band structures in the growth direction. Optical enhancement is shown to exist by comparing the direct and indirect transitions in the band structures with the related transitions in bulk Si. The role played by the interface on the optical properties is assessed by comparing the absorption coefficients from the two models.
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页数:7
相关论文
共 31 条
[1]   OPTICAL-RESPONSE OF HIGH-TEMPERATURE SUPERCONDUCTORS BY FULL-POTENTIAL LAPW BAND-STRUCTURE CALCULATIONS [J].
ABT, R ;
KAMBROSCHDRAXL, C ;
KNOLL, P .
PHYSICA B, 1994, 194 (pt 2) :1451-1452
[2]   FULL-POTENTIAL, LINEARIZED AUGMENTED PLANE-WAVE PROGRAMS FOR CRYSTALLINE SYSTEMS [J].
BLAHA, P ;
SCHWARZ, K ;
SORANTIN, P ;
TRICKEY, SB .
COMPUTER PHYSICS COMMUNICATIONS, 1990, 59 (02) :399-415
[3]  
BLAHA P, 1997, COMPUTER CODE WIEN 9
[4]   SILICON QUANTUM WIRE ARRAY FABRICATION BY ELECTROCHEMICAL AND CHEMICAL DISSOLUTION OF WAFERS [J].
CANHAM, LT .
APPLIED PHYSICS LETTERS, 1990, 57 (10) :1046-1048
[5]   Excitons and optical properties of α-quartz [J].
Chang, EK ;
Rohlfing, M ;
Louie, SG .
PHYSICAL REVIEW LETTERS, 2000, 85 (12) :2613-2616
[6]   PREFERENTIAL PROPAGATION OF PORES DURING THE FORMATION OF POROUS SILICON - A TRANSMISSION ELECTRON-MICROSCOPY STUDY [J].
CHUANG, SF ;
COLLINS, SD ;
SMITH, RL .
APPLIED PHYSICS LETTERS, 1989, 55 (07) :675-677
[7]  
HERMAN F, 1978, PHYSICS SIO2 ITS INT
[8]  
Herman M.A., 1989, MOL BEAM EPITAXY
[9]   MICROSCOPIC STRUCTURE OF THE SIO2/SI INTERFACE [J].
HIMPSEL, FJ ;
MCFEELY, FR ;
TALEBIBRAHIMI, A ;
YARMOFF, JA ;
HOLLINGER, G .
PHYSICAL REVIEW B, 1988, 38 (09) :6084-6096
[10]   INHOMOGENEOUS ELECTRON-GAS [J].
RAJAGOPAL, AK ;
CALLAWAY, J .
PHYSICAL REVIEW B, 1973, 7 (05) :1912-1919