Effect of nitrogen and temperature on the electronic band structure of GaAs1-xNx alloys

被引:39
作者
Chtourou, R
Bousbih, F
Ben Bouzid, S
Charfi, FF
Harmand, JC
Ungaro, G
Largeau, L
机构
[1] Inst Preparatoire Etud Sci & Tech, Unite Rech Phys Semicond, La Marsa 2070, Tunisia
[2] CNRS, Lab Photon & Nanostruct, F-91460 Marcoussis, France
关键词
D O I
10.1063/1.1462864
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have studied the band-gap reduction of GaAs1-xNx alloys with N contents between 0.1% and 1.5% using the absorption measurements in a series of samples grown by molecular-beam epitaxy. At room temperature, we observed a redshift of the band edge of about 205 meV for 1% of nitrogen. To interpret this effect, we assume that the incorporation of nitrogen in GaAs breaks the symmetry of the system and introduces localized N states that are weakly coupled to the extended states of the semiconductor. We have also studied the temperature dependence of the band gap of GaAsN alloys. The band-gap energy difference between 15 and 300 K decreases from 110 meV for GaAs, to 70 meV for GaAs0.985N0.015. All these experimental results can be explained by the band anticrossing model [W. Shan , Phys. Status Solidi B 223, 75 (2001)] with a coupling constant C-NM of 2.7 eV, taking into account the contribution of tensile strain to the band-gap reduction. (C) 2002 American Institute of Physics.
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页码:2075 / 2077
页数:3
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