Diagnostics of an inductively coupled CF4/Ar plasma

被引:40
作者
Hioki, K [1 ]
Hirata, H
Matsumura, S
Petrovic, ZL
Makabe, T
机构
[1] Keio Univ, Dept Elect Engn, Fac Sci & Technol, Yokohama, Kanagawa 2238522, Japan
[2] Musashi Inst Technol, Tokyo 1588557, Japan
[3] Univ Belgrade, Inst Phys, YU-11001 Belgrade, Yugoslavia
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2000年 / 18卷 / 03期
关键词
D O I
10.1116/1.582268
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Experimental data for radiative and metastable state densities in pure argon and in mixture of 5% CF4 in argon are obtained to study the effect of CF, on kinetics of inductively coupled plasma (ICP). The measurements were made by a combination of optical emission spectroscopy and computer tomography for radiative levels and by laser absorption for metastable state profiles, The data were obtained in an inductively coupled rf (13.56 MHz) plasma with a single coil and full cylindrical symmetry. At low pressures of 5 and 15 mTorr the data in pure argon and in the mixture do not differ much, both in the magnitude and in the radial and axial profiles. However, at 50, 100, and 300 mTorr there is a dramatic change when CF4 is introduced. The metastable density increases due to the smaller electron induced quenching while axial and radial profiles are quite different. Unfortunately introduction of CFS spoils the degree of azimuthal isotropy. The observed results and explanations based on the important role of metastables and stepwise processes in kinetics of high electron density ICP are supported by measurements of plasma density by using a double probe. (C) 2000 American Vacuum Society. [S0734-2101(00)01303-8].
引用
收藏
页码:864 / 872
页数:9
相关论文
共 51 条
[1]  
BARANOV IY, 1981, OPT SPECTROSC, V51, P1316
[2]   INVESTIGATION ABOUT STEPWISE EXCITATION CROSS-SECTIONS IN RARE-GASES [J].
BEHNKE, JF ;
DEUTSCH, H ;
SCHEIBNER, H .
CONTRIBUTIONS TO PLASMA PHYSICS, 1985, 25 (01) :41-56
[3]  
BERSIN RL, 1970, SOLID STATE TECHNOL, V13, P39
[4]   INFLUENCE OF EXCITED-STATES ON THE ELECTRON-DISTRIBUTION FUNCTION IN AN ARGON PLASMA FOR DISCHARGE AND POSTDISCHARGE CONDITIONS [J].
BRETAGNE, J ;
CAPITELLI, M ;
GORSE, C ;
PUECH, V .
EUROPHYSICS LETTERS, 1987, 3 (11) :1179-1184
[5]   Two-dimensional fluid model of an inductively coupled plasma with comparison to experimental spatial profiles [J].
Bukowski, JD ;
Graves, DB ;
Vitello, P .
JOURNAL OF APPLIED PHYSICS, 1996, 80 (05) :2614-2623
[6]   DIODE AND HOLLOW-CATHODE ETCHING IN CF4 [J].
DAVIES, KE ;
HORWITZ, CM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (04) :2705-2708
[7]  
Flamm DL, 1981, PLASMA CHEM PLASMA P, V1, P37, DOI DOI 10.1007/BF00566374
[8]  
Francis A, 1999, INTERNATIONAL CONFERENCE ON PHENOMENA IN IONIZED GASES, VOL IV, PROCEEDINGS, P43
[9]   Electromagnetic field structure in a weakly collisional inductively coupled plasma [J].
Godyak, VA ;
Piejak, RB .
JOURNAL OF APPLIED PHYSICS, 1997, 82 (12) :5944-5947
[10]   MODELING OF RADIO-FREQUENCY PLASMAS IN TETRAFLUOROMETHANE (CF4) - THE GAS-PHASE PHYSICS AND THE ROLE OF NEGATIVE-ION DETACHMENT [J].
GOGOLIDES, E ;
STATHAKOPOULOS, M ;
BOUDOUVIS, A .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1994, 27 (09) :1878-1886