The influence of high energy proton bombardment on the electrical and defect properties of single-crystal ZnO

被引:58
作者
Auret, FD [1 ]
Goodman, SA
Hayes, M
Legodi, MJ
van Laarhoven, HA
Look, DC
机构
[1] Univ Pretoria, Dept Phys, ZA-0002 Pretoria, South Africa
[2] Wright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
[3] USAF, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
关键词
D O I
10.1088/0953-8984/13/40/315
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We report on the electrical and defect characterization of Au Schottky diodes formed on single-crystal ZnO, before and after irradiating with high-energy (1.8 MeV) protons. Prior to bombardment we observed that several electron traps (E1-E4), with energies between 0.10 and 0.57 eV below the conduction band, are present in the ZnO. High-energy proton bombardment introduces two electron traps (Ep1 and Ep2), with extremely low introduction rates (eta) of 2.4 and 1.9 cm(-1), respectively. Schottky barrier properties such as the reverse leakage current deteriorated from I x 10(-9) A for an unirradiated diode to 1 X 10(-6) A after bombarding it with a dose of 4.2 x 10(14) cm(-2) protons. Compared to GaN we found that ZnO is remarkably resistant to high-energy proton bombardment.
引用
收藏
页码:8989 / 8999
页数:11
相关论文
共 23 条
  • [1] Proton bombardment-induced electron traps in epitaxially grown n-GaN
    Auret, FD
    Goodman, SA
    Koschnick, FK
    Spaeth, JM
    Beaumont, B
    Gibart, P
    [J]. APPLIED PHYSICS LETTERS, 1999, 74 (03) : 407 - 409
  • [2] Electrical characterization of two deep electron traps introduced in epitaxially grown n-GaN during He-ion irradiation
    Auret, FD
    Goodman, SA
    Koschnick, FK
    Spaeth, JM
    Beaumont, B
    Gibart, P
    [J]. APPLIED PHYSICS LETTERS, 1998, 73 (25) : 3745 - 3747
  • [3] AURET FD, 2001, UNPUB APPL PHYS LETT
  • [4] Deep centers in n-GaN grown by reactive molecular beam epitaxy
    Fang, ZQ
    Look, DC
    Kim, W
    Fan, Z
    Botchkarev, A
    Morkoc, H
    [J]. APPLIED PHYSICS LETTERS, 1998, 72 (18) : 2277 - 2279
  • [5] FRENKEL J, 1938, PHYS REV, V54, P657
  • [6] GOODMAN SA, 2001, UNPUB APPL PHYS LETT
  • [7] Ion implantation induced defects in epitaxial 4H-SiC
    Hallén, A
    Henry, A
    Pellegrino, E
    Svensson, BG
    Åberg, D
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1999, 61-2 : 378 - 381
  • [8] ADMITTANCE SPECTROSCOPY OF CU-DOPED ZNO CRYSTALS
    KANAI, Y
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (04): : 703 - 707
  • [9] ADMITTANCE SPECTROSCOPY OF ZNO CRYSTALS CONTAINING AG
    KANAI, Y
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (9A): : 2021 - 2022
  • [10] ADMITTANCE SPECTROSCOPY OF ZNO CRYSTALS
    KANAI, Y
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1990, 29 (08): : 1426 - 1430