Account of photoelectron elastic determination of overlayer thickness, in-depth profiling, escape depth, attenuation coefficients and intensities in surface systems

An analytical connection is found between parameters of Monte Carlo and transport theory methods to account for elastic electron scattering in solids. A simple analytical method is proposed for the intensity calculations in X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) with account of elastic scattering. The method is applied for solution of many problems in XPS including determination of the overlayer thickness, correction factors for the in-depth profiling, escape depth, attenuation lengths, intensities in layered systems. (C) 1997 Elsevier Science B.V.