THE EFFECT OF ELASTIC PHOTOELECTRON SCATTERING ON DEPTH-PROFILING BY ANGULAR RESOLVED X-RAY PHOTOELECTRON-SPECTROSCOPY

被引：30

作者：

BASCHENKO, OA

NESMEEV, AE

机构：

[1] Institute of General and Inorganic Chemistry, Academy of Sciences, the USSR, Moscow, 117907

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1991年 / 57卷 / 01期

关键词：

D O I：

10.1016/0368-2048(91)85012-I

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

By means of Monte-Carlo calculation the effect of elastic photoelectron scattering on angular resolved X-ray photoelectron spectroscopy (ARXPS) data has been established. A method which accounts for this effect while restoring concentration profiles from ARXPS data has been proposed. A number of model examples showing that elastic scattering leads to about a 20% decrease of the effective photoelectron mean free paths in a solid sample have been considered.

引用

页码：33 / 46

页数：14

共 28 条

[1] DEPTH PROFILING OF ELEMENTS IN SURFACE-LAYERS OF SOLIDS BASED ON ANGULAR RESOLVED X-RAY PHOTOELECTRON-SPECTROSCOPY
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[9] BASCHENKO OA, 1991, POVERHN, V8, P35
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