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Chemical amplification resists: History and development within IBM

被引：102
作者：
Ito, H
机构：
[1] IBM Research Division, Almaden Research Center, San Jose, CA 95120
[2] Science and Technology Department, Almaden Research Center
[3] Chemistry Department, State University of New York, Syracuse, NY
[4] IBM, San Jose Research Laboratory
[5] American Chemical Society, Society of Polymer Science
来源：
IBM JOURNAL OF RESEARCH AND DEVELOPMENT | 1997年 / 41卷 / 1-2期
关键词：
D O I：
10.1147/rd.411.0069
中图分类号：
TP3 [计算技术、计算机技术];
学科分类号：
0812 ;
摘要：
The chemical amplification concept was invented at ISM Research and quickly brought into use in the production of dynamic random access memory devices in the company. It has remained as an important foundation for the design of advanced resist systems for use in short-wavelength (<300-nm) lithographic technologies.
引用
收藏
页码：69 / 80
页数：12
相关论文
共 60 条
  • [1] ALLEN RD, 1995, P SOC PHOTO-OPT INS, V2438, P474, DOI 10.1117/12.210396
  • [2] Photoresists for 193-nm lithography
    Allen, RD
    Wallraff, GM
    Hofer, DC
    Kunz, RR
    [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1997, 41 (1-2) : 95 - 104
  • [3] HIGH-PERFORMANCE ACRYLIC POLYMERS FOR CHEMICALLY AMPLIFIED PHOTORESIST APPLICATIONS
    ALLEN, RD
    WALLRAFF, GM
    HINSBERG, WD
    SIMPSON, LL
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 3357 - 3361
  • [4] ALLEN RD, 1994, J PHOTOPOLYM SCI TEC, V7, P507
  • [5] BREYTA G, 1994, J PHOTOPOLYM SCI TEC, V7, P449
  • [6] BRUNSVOLD W, 1993, P SOC PHOTO-OPT INS, V1925, P377, DOI 10.1117/12.154772
  • [7] CONLEY W, 1993, P SOC PHOTO-OPT INS, V1925, P120, DOI 10.1117/12.154744
  • [8] Conley W., 1990, Proceedings of the SPIE - The International Society for Optical Engineering, V1262, P49, DOI 10.1117/12.20087
  • [9] Coopmans F., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V631, P34, DOI 10.1117/12.963623
  • [10] THE ROLE OF THE LATENT IMAGE IN A NEW DUAL IMAGE, AQUEOUS DEVELOPABLE, THERMALLY STABLE PHOTORESIST
    FEELY, WE
    IMHOF, JC
    STEIN, CM
    [J]. POLYMER ENGINEERING AND SCIENCE, 1986, 26 (16) : 1101 - 1104
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