Chemical amplification resists: History and development within IBM

被引：102

作者：

Ito, H

机构：

[1] IBM Research Division, Almaden Research Center, San Jose, CA 95120

[2] Science and Technology Department, Almaden Research Center

[3] Chemistry Department, State University of New York, Syracuse, NY

[4] IBM, San Jose Research Laboratory

[5] American Chemical Society, Society of Polymer Science

来源：

IBM JOURNAL OF RESEARCH AND DEVELOPMENT | 1997年 / 41卷 / 1-2期

关键词：

D O I：

10.1147/rd.411.0069

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

The chemical amplification concept was invented at ISM Research and quickly brought into use in the production of dynamic random access memory devices in the company. It has remained as an important foundation for the design of advanced resist systems for use in short-wavelength (<300-nm) lithographic technologies.

引用

页码：69 / 80

页数：12

共 60 条

[21] ITO H, 1995, P SOC PHOTO-OPT INS, V2438, P53, DOI 10.1117/12.210353
[22] THERMALLY DEVELOPABLE, POSITIVE RESIST SYSTEMS WITH HIGH-SENSITIVITY
ITO, H
SCHWALM, R
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (01) : 241 - 245
[23] ITO H, 1993, P SOC PHOTO-OPT INS, V1925, P65, DOI 10.1117/12.154794
[24] Ito H., 1988, Proceedings of the SPIE - The International Society for Optical Engineering, V920, P33, DOI 10.1117/12.968299
[25] Ito H, 1995, ACS SYM SER, V614, P21
[26] ITO H, 1994, ACS SYM SER, V579, P70
[27] ITO H, 1992, J PHOTOPOLYM SCI TEC, V5, P123
[28] ITO H, 1993, ACS SYM SER, V537, P64
[29] ITO H, 1982, NOV P SPE REG TECH C, P331
[30] Ito H., 1985, US Patent, Patent No. [4,491,628, 4491628]

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