Spectroscopic interference microscopy technique for measurement of layer parameters

被引：23

作者：

Abdulhalim, I ^{[1
]}

机构：

[1] Univ Paisley, Elect Engn & Phys Div, Thin Film Ctr, Sch Informat & Commun, Paisley PA1 2BE, Renfrew, Scotland

来源：

MEASUREMENT SCIENCE AND TECHNOLOGY | 2001年 / 12卷 / 11期

关键词：

interference microscopy; multi-layers; thin film optics; optical metrology;

D O I：

10.1088/0957-0233/12/11/332

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A novel method is proposed for the measurement of layer parameters using spectroscopic double-beam interference microscopy.. The contribution of each partial wave reflected from the layer interfaces to the interferogram is treated separately and the total interferogram is obtained as their coherent sum. When an annulus aperture is used, an analytic expression is derived for the interferogram that allows fast direct comparison between measured and calculated spectra from which refractive indices and thickness of layers can be determined simultaneously. Subnanometre accuracy of the film thickness measurement is shown to be possible.

引用

页码：1996 / 2001

页数：6

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