High-temperature STM for atomic processes on semiconductor surfaces

被引:8
作者
Iwatsuki, M
Sato, T
Yamamoto, Y
机构
[1] JEOL Ltd., Akishima, Tokyo 196
关键词
D O I
10.1016/0169-4332(95)00249-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
This paper describes a new ultrahigh-vacuum scanning tunneling microscope (UHV-STM) which allows atomic-level observation as a function of temperature. It also reports on the use of this instrument for some high-temperature (HT) and low-temperature (LT) studies of semiconductor surfaces including various surface changes of the Si(111), Si(110) and Si(100) surfaces to new reconstructed structures at high temperatures, various surface behaviors, ultra-micro-processing; adsorption of different atom species and growth processes and low-temperature bucking structures of Si(100) dimer rows during ultra-low temperature observation.
引用
收藏
页码:321 / 330
页数:10
相关论文
共 23 条
[1]   TUNNELING THROUGH A CONTROLLABLE VACUUM GAP [J].
BINNIG, G ;
ROHRER, H ;
GERBER, C ;
WEIBEL, E .
APPLIED PHYSICS LETTERS, 1982, 40 (02) :178-180
[2]  
CAHILL D, 1991, STM 91, P146
[3]   SCANNING TUNNELING MICROSCOPY AND SPECTROSCOPY OF THE SI(111)5X5 SURFACE [J].
FEENSTRA, RM ;
LUTZ, MA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (02) :716-720
[4]   LOW-TEMPERATURE ULTRA-HIGH-VACUUM SCANNING TUNNELING MICROSCOPE [J].
GAISCH, R ;
GIMZEWSKI, JK ;
REIHL, B ;
SCHLITTLER, RR ;
TSCHUDY, M ;
SCHNEIDER, WD .
ULTRAMICROSCOPY, 1992, 42 :1621-1626
[5]   HIGH-TEMPERATURE SCANNING-TUNNELING-MICROSCOPY OBSERVATION OF PHASE-TRANSITIONS AND RECONSTRUCTION ON A VICINAL SI(111) SURFACE [J].
HIBINO, H ;
FUKUDA, T ;
SUZUKI, M ;
HOMMA, Y ;
SATO, T ;
IWATSUKI, M ;
MIKI, K ;
TOKUMOTO, H .
PHYSICAL REVIEW B, 1993, 47 (19) :13027-13030
[6]  
Ichimiya A., 1994, Surface Review and Letters, V1, P1, DOI 10.1142/S0218625X94000023
[7]   A LOW-TEMPERATURE ULTRAHIGH-VACUUM SCANNING TUNNELING MICROSCOPE SYSTEM AND TUNNELING SPECTRA OF THE BI2212 SUPERCONDUCTOR [J].
IKEDA, K ;
TAKAMUKU, K ;
KUBOTA, H ;
ITTI, R ;
KOSHIZUKA, N .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1993, 64 (08) :2221-2224
[8]  
ION S, 1977, JPN J APPL PHYS, V16, P891
[9]   OBSERVATION OF SURFACE RECONSTRUCTION AND NANO-FABRICATION ON SILICON UNDER HIGH-TEMPERATURE USING A UHV-STM [J].
IWATSUKI, M ;
KITAMURA, S ;
SATO, T ;
SUEYOSHI, T .
APPLIED SURFACE SCIENCE, 1992, 60-1 :580-586
[10]   Nano-fabrication on silicon at high temperature in a UHV-STM [J].
Iwatsuki, M. ;
Kitamura, S. ;
Sato, T. ;
Sueyoshi, T. .
Nanotechnology, 1992, 3 (03) :137-141