Adsorption process of metastable molecular oxygen on a Si(111)-(7 x 7) surface

被引：31

作者：

Sakamoto, K ^{[1
]}

Doi, S

Ushimi, Y

Ohno, K

Yeom, HW

Ohta, T

Suto, S

Uchida, W

机构：

[1] Tohoku Univ, Dept Phys, Grad Sch Sci, Sendai, Miyagi 9808578, Japan

[2] Univ Tokyo, Res Ctr Spectrochem, Tokyo 1130033, Japan

来源：

PHYSICAL REVIEW B | 1999年 / 60卷 / 12期

关键词：

D O I：

10.1103/PhysRevB.60.R8465

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The adsorption process of metastable molecular oxygen on a Si(111)-(7 x 7) surface is studied by ultraviolet photoelectron spectroscopy. At 120 K, three metastable states at 2.1, 3.8, and 5.1 eV grow up simultaneously following the decrease of the back-bond state as the dosage increases. After annealing at 600 K, we observed an unusual state attributed to the dangling bond. These results and the symmetries of the molecular orbitals lead to a conclusion that the metastable molecular species is adsorbed on top of an adatom stabilized by a coadsorbed atomic oxygen into the back bond.

引用

页码：R8465 / R8468

页数：4

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