Hydrogen-induced transport properties of holes in diamond surface layers

被引:86
作者
Nebel, CE [1 ]
Sauerer, C
Ertl, F
Stutzmann, M
Graeff, CFO
Bergonzo, P
Williams, OA
Jackman, R
机构
[1] Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
[2] Univ Sao Paulo, FFCLRP, DFM, BR-05508 Sao Paulo, Brazil
[3] CEA Rech Technol, LIST, DIMIR, SIAR Saclay, F-91191 Gif Sur Yvette, France
[4] UCL, London WC1E 7JE, England
关键词
D O I
10.1063/1.1429756
中图分类号
O59 [应用物理学];
学科分类号
摘要
Three hydrogen-terminated diamonds with different surface roughness and morphologies have been investigated by conductivity and Hall experiments in the temperature regime 0.34-350 K. The sheet hole densities are weakly temperature dependent above a critical temperature T(c) (20 K less than or equal toT(c)less than or equal to 70 K), below T(c) carriers freeze out. The mobilities of holes show a minimum at T(c) increasing towards higher and even stronger towards lower temperatures significantly up to 400 cm2/V s. A transport model is introduced where holes propagate in the valence band where a disorder-induced tail of localized states is present. (C) 2001 American Institute of Physics.
引用
收藏
页码:4541 / 4543
页数:3
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