Morphology and composition of ArF excimer laser deposited carbon nitride films as determined by analytical TEM

被引:8
作者
Geszti, O
Radnóczi, G
Bertóti, I
Szörényi, T
Antoni, F
Fogarassy, E
机构
[1] Hungarian Acad Sci, Reg Grp Laser Phys, H-6701 Szeged, Hungary
[2] Res Inst Tech Phys & Mat Sci, H-1525 Budapest, Hungary
[3] Hungarian Acad Sci, Chem Res Ctr, H-1525 Budapest, Hungary
[4] CNRS, PHASE, F-67037 Strasbourg 2, France
关键词
carbon nitride; PLD ablation; thin films; microstructure;
D O I
10.1016/S0169-4332(01)00758-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Carbon nitride films deposited onto room temperature silicon substrates by ArF excimer laser ablation of a graphite target in nitrogen atmosphere have been investigated after floating off in transmission electron microscope (TEM). All films fabricated in the 1 - 100 Pa N-2 pressure and 1 - 10 J cm(-2) fluence domain are amorphous. It is the nitrogen pressure that governs both the composition and the morphology of the films. the effect of the laser fluence being weaker. The morphologies range from dense films grown in 1-5 Pa N-2, to structures composed of carbon nitride clusters and voids between them, obtained at and above 50 Pa N-2. Ablation with pulses of high fluence (10 J cm-2) results in more compact films, The oxygen content determined by energy dispersive X-ray spectrometry well correlates with the compactness of the films, being significantly higher in those fabricated at higher pressures and composed of clusters. (C) 2002 Elsevier Science B.V.. All rights reserved.
引用
收藏
页码:502 / 506
页数:5
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