Pulsed laser deposition of carbon nitride films by a sub-ps laser

被引：9

作者：

Geretovszky, Z

Kántor, Z

Bertóti, I

Szörényi, T

机构：

[1] JATE Univ, Dept Opt & Quantum Elect, H-6701 Szeged, Hungary

[2] Hungarian Acad Sci, Res Grp Laser Phys, H-6701 Szeged, Hungary

[3] Hungarian Acad Sci, Res Lab Mat & Environm Chem, Chem Res Ctr, H-1525 Budapest, Hungary

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2000年 / 70卷 / 01期

关键词：

D O I：

10.1007/s003390050003

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

CNx (0.01 < x < 0.06) films were grown from a graphite target by pulsed laser deposition in a low-pressure nitrogen environment at room temperature, using a sub-ps ultraviolet laser. With increasing nitrogen pressure from 3 x 10(-2) to 0.6 mbar the nitrogen content of the films increases monotonously, as determined by X-ray photoelectron spectroscopy. Raman spectroscopy reveals that the films consist predominantly of highly amorphous carbon.

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页码：9 / 11

页数：3

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