Development of 157 nm positive resists

被引：50

作者：

Ito, H ^{[1
]}

Wallraff, GM ^{[1
]}

Fender, N ^{[1
]}

Brock, PJ ^{[1
]}

Hinsberg, WD ^{[1
]}

Mahorowala, A ^{[1
]}

Larson, CE ^{[1
]}

Truong, HD ^{[1
]}

Breyta, G ^{[1
]}

Allen, RD ^{[1
]}

机构：

[1] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2001年 / 19卷 / 06期

关键词：

D O I：

10.1116/1.1415512

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

For adequate transparency we have selected hexafluoroisopropanol as an acid group and an alpha-trifluoromethylacrylic moiety as a repeat unit of our 157 nm resist polymers. The hexafluoroalcohol group is bound to norbornene or styrene. Four platforms are currently available to us: (1) all-acrylic, (2) all-alicyclic, (3) acrylic-alicyclic, and (4) acrylic-aromatic systems. While the all-alicyclic (all-norbornene) polymers are synthesized by transition-metal-initiated addition polymerization, all other polymers involving a-trifluoromethylacrylic monomers are prepared by conventional radical copolymerization. Characterization of the polymers and preliminary lithographic evaluation are reported. (C) 2001 American Vacuum Society.

引用

页码：2678 / 2684

页数：7

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