A closer study on the self-annihilation of antiphase boundaries in GaAs epilayers

被引:43
作者
Li, Y [1 ]
Giling, LJ [1 ]
机构
[1] UNIV NIJMEGEN,MAT RES INST,DEPT SOLID STATE PHYS 3,6525 ED NIJMEGEN,NETHERLANDS
关键词
D O I
10.1016/0022-0248(95)00975-2
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The self-annihilation of antiphase boundaries (APBs) in GaAs epilayers is studied experimentally by following the course of the evolution of the APBs in two ways: (1) growing epitaxially GaAs on a GaAs surface which already contained APBs, to investigate the development of the APBs in the new layer by optical microscopy; and (2) layer-by-layer APE-revealing etching followed by mechano-chemical polishing of a GaAs epilayer possessing APBs to study the growth history of APBs. It is found that the self-annihilation of APBs occurs by rearrangement of randomly oriented APBs into ordered APBs, which lie in {011} planes, followed by propagation of APBs along the {011} planes which have an angle of 45 degrees with the (001) surface, until they completely annihilate at their intersections.
引用
收藏
页码:203 / 211
页数:9
相关论文
共 22 条
[21]   INFLUENCE OF SUBSTRATE DEFECTS ON THE STRUCTURE OF EPITAXIAL GAAS GROWN BY MOCVD [J].
WEYHER, JL ;
VANDEVEN, J .
JOURNAL OF CRYSTAL GROWTH, 1988, 88 (02) :221-228
[22]  
WOJTCZUK SJ, 1991, P 22 IEEE PHOT SPEC, P73