Structural and optical properties of ZnO films grown on R-Al2O3 substrates

被引：36

作者：

Zhang, BP

Segawa, Y

Wakatsuki, K

Kashiwaba, Y

Haga, K

机构：

[1] RIKEN, Inst Phys & Chem Res, Photodynam Res Ctr, Aoba Ku, Sendai, Miyagi 9800845, Japan

[2] Tohoku Univ, Dept Phys, Sendai, Miyagi 9808578, Japan

[3] Sendai Natl Coll Technol, Sendai, Miyagi 9893124, Japan

来源：

APPLIED PHYSICS LETTERS | 2001年 / 79卷 / 24期

关键词：

D O I：

10.1063/1.1426255

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Structural and optical properties of ZnO films grown on R-Al2O3 substrates by atmospheric pressure chemical-vapor deposition were investigated using x-ray diffraction and photoluminescence. The (11 (2) over bar0) plane of the ZnO film tilted 0.3 degrees with respect to the (1 (1) over bar 02) plane of the substrate and rotated about 7 degrees around the normal of the sample surface. Symmetric (11 (2) over bar0) and asymmetric (20 (2) over bar2) x-ray reflection on ZnO films with different thicknesses were carried out. Comparison with photoluminescence measurements allowed us to conclude that the optical properties of the ZnO films are predominately determined by the in-plane, rather than out-of-plane, structural features. (C) 2001 American Institute of Physics.

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收藏

页码：3953 / 3955

页数：3

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