Scattering studies of nanoporous organosilicate thin films imprinted with reactive star porogens

被引：53

作者：

Lee, B

Oh, W

Yoon, J

Hwang, Y

Kim, J

Landes, BG

Quintana, JP

Ree, M ^{[1
]}

机构：

[1] Pohang Univ Sci & Technol, Natl Res Lab Polymer Synth & Phys, Pohang Accelerator Lab, Ctr Integrated Mol Syst,Dept Chem,Polymer Res Ins, Pohang 790784, South Korea

[2] Pohang Univ Sci & Technol, Div Mol & Life Sci, Pohang 790784, South Korea

[3] Pohang Univ Sci & Technol, Sch Environm Sci & Engn, Pohang 790784, South Korea

[4] Dow Chem Co USA, Dept Analyt Sci Mat Characterizat, Midland, MI 48667 USA

[5] Argonne Natl Lab, DND, CAT, Ctr Synchrotron Radiat, Argonne, IL 60439 USA

来源：

MACROMOLECULES | 2005年 / 38卷 / 22期

关键词：

D O I：

10.1021/ma0501951

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Nanoporous organosilicate, poly(methylsilsesquioxane), thin films imprinted with reactive star porogens were analyzed using TSAXS and GISAXS. It was found that the nanopores generated in the dielectric film by he sacrificial thermal degradation of the PCL4 porogens were spherical in shape. It was observed that the reactive triathlons modification of the end groups of four-armed porogens prevents severe aggregation of star-shaped porogens with multiple arms in the preparation of ultralow-k nanoporous dielectric films. The results show that GISAXS combined with TSAXS can quantitatively characterize the structures and properties of ultralow-k nanoporous dielectric thin films on substrates.

引用

页码：8991 / 8995

页数：5

共 27 条

[1] Current status of the synchrotron small-angle X-ray scattering station BL4C1 at the Pohang Accelerator Laboratory [J].

Bolze, J ;

Kim, J ;

Huang, JY ;

Rah, S ;

Youn, HS ;

Lee, B ;

Shin, TJ ;

Ree, M .

MACROMOLECULAR RESEARCH, 2002, 10 (01) :2-12

[2] Synchrotron X-ray reflectivity study on the structure of templated polyorganosilicate thin films and their derived nanoporous analogues [J].

Bolze, J ;

Ree, M ;

Youn, HS ;

Chu, SH ;

Char, K .

LANGMUIR, 2001, 17 (21) :6683-6691

[3]

Hedrick JL, 1998, ADV MATER, V10, P1049, DOI 10.1002/(SICI)1521-4095(199809)10:13<1049::AID-ADMA1049>3.0.CO

[4]

2-F

[5] Pore size distributions in nanoporous methyl silsesquioxane films as determined by small angle x-ray scattering [J].

Huang, E ;

Toney, MF ;

Volksen, W ;

Mecerreyes, D ;

Brock, P ;

Kim, HC ;

Hawker, CJ ;

Hedrick, JL ;

Lee, VY ;

Magbitang, T ;

Miller, RD ;

Lurio, LB .

APPLIED PHYSICS LETTERS, 2002, 81 (12) :2232-2234

[6] Neutron reflectivity on nanoporous poly(methylsilsesquioxane) thin films [J].

Kim, HC ;

Volksen, W ;

Miller, RD ;

Huang, E ;

Yang, GY ;

Briber, RM ;

Shin, K ;

Satija, SK .

CHEMISTRY OF MATERIALS, 2003, 15 (03) :609-611

[7] Imprinting of nanopores in organosilicate dielectric thin films with hyperbranched ketalized polyglycidol [J].

Kim, JS ;

Kim, HC ;

Lee, B ;

Ree, M .

POLYMER, 2005, 46 (18) :7394-7402

[8] HARD-SPHERE INTERACTIONS BETWEEN SPHERICAL DOMAINS IN DIBLOCK COPOLYMERS [J].

KINNING, DJ ;

THOMAS, EL .

MACROMOLECULES, 1984, 17 (09) :1712-1718

[9] Structural analysis of block copolymer thin films with grazing incidence small-angle X-ray scattering [J].

Lee, B ;

Park, I ;

Yoon, J ;

Park, S ;

Kim, J ;

Kim, KW ;

Chang, T ;

Ree, M .

MACROMOLECULES, 2005, 38 (10) :4311-4323

[10] In-situ grazing incidence small-angle X-ray scattering studies on nanopore evolution in low-k organosilicate dielectric thin films [J].

Lee, B ;

Yoon, J ;

Oh, W ;

Hwang, Y ;

Heo, K ;

Jin, KS ;

Kim, J ;

Kim, KW ;

Ree, M .

MACROMOLECULES, 2005, 38 (08) :3395-3405

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