Study of interfaces in GaInSb InAs quantum wells by high-resolution X-ray diffraction and reciprocal space mapping

被引:12
作者
Tomich, DH
Mitchel, WC
Chow, P
Tu, CW
机构
[1] MLPO, AFRL, Wright Patterson AFB, OH 45433 USA
[2] SVT Associates, Eden Prairie, MN 55344 USA
[3] Univ Calif San Diego, Dept Elect & Comp Engn, La Jolla, CA 92093 USA
关键词
molecular beam epitaxy; compound semiconductors; heterostructures; quantum wells; high-resolution X-ray diffraction; GaInSb InAs;
D O I
10.1016/S0022-0248(98)01477-8
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The electrical and optical properties of advanced epitaxial structures, such as quantum wells and superlattices are strongly influenced by the quality of their interfaces. The GaInSb/InAs system is particularly important because of its promise for use in infrared detection in the 8-14 mu m ranges, In this material system the two compounds do not share a common anion, and different bond types exist at the interface depending upon the growth parameters. We have looked at single quantum-well structures grows with solid source molecular beam epitaxy such that a distinct interface type would be found in each sample. X-ray rocking curves and full dynamical simulations were performed for each quantum well structure. Quantum wells with three types of interfaces were grown and analyzed; random interfaces, Sb-like interfaces. and As-like interfaces formed with a one monolayer group III deposition follow cd by a five second group V soak. With the exception of the interfaces, all three sows have nominally the same structure; 5000 Angstrom of GaSb buffer layer grown upon a GaSb substrate, a 150 Angstrom quantum well with 35 Angstrom Ga0.75In0.25Sb barriers and a final GaSb cap layer of 50 Angstrom thickness. Well-resolved Pendellosung fringes were found in all samples indicating high quality in the epitaxial layers and interfaces. The SQW with the As-like interfaces had the highest degree of quality as evidenced by persistence of the fringes. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:868 / 871
页数:4
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