Experimental comparison of off-axis illumination and imaging interferometric lithography

被引：12

作者：

Chen, XL ^{[1
]}

Brueck, SRJ ^{[1
]}

机构：

[1] Univ New Mexico, Ctr High Technol Mat, Albuquerque, NM 87106 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1999年 / 17卷 / 03期

关键词：

D O I：

10.1116/1.590670

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Imaging interferometric lithography (IIL) has been proposed recently to extend optical lithography (OL) to the linear systems resolution limit of optics. In this work, a comparison of IIL and OL with off-axis illumination (OAI) is presented with both numerical simulations and experimental verification. In OAI, the optical modulation transfer function decreases at higher spatial frequencies as a result of the inclusion of the same low frequencies in mope than one of the incoherently related offset exposures. Pupil plane filters avoid this multiple counting of the low frequency components and improve the pattern fidelity. Different filters provide different tiling of spatial frequency space and result in significant differences in the final patterns. Results of different tiling schemes for both OAI and IIL approaches are discussed. Overall, IIL provides the most robust imaging results. (C) 1999 American Vacuum Society.

引用

页码：921 / 929

页数：9

共 15 条

[11] IMPROVING RESOLUTION IN PHOTOLITHOGRAPHY WITH A PHASE-SHIFTING MASK
LEVENSON, MD
VISWANATHAN, NS
SIMPSON, RA
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (12) : 1828 - 1836
[12] LIEBMANN LW, 1994, P SOC PHOTO-OPT INS, V2322, P229, DOI 10.1117/12.195818
[13] NOGUCHI M, 1992, P SOC PHOTO-OPT INS, V1674, P92, DOI 10.1117/12.130312
[14] ORII S, 1994, P SOC PHOTO-OPT INS, V2197, P854, DOI 10.1117/12.175477
[15] SHIRAISHI N, 1992, P SOC PHOTO-OPT INS, V1674, P741, DOI 10.1117/12.130364

← 1 2 →