Nanotransfer Printing with sub-10 nm Resolution Realized using Directed Self-Assembly

被引：87

作者：

Jeong, Jae Won ^{[1
]}

Park, Woon Ik ^{[1
]}

Do, Lee-Mi ^{[2
]}

Park, Jong-Hyun ^{[3
]}

Kim, Tae-Heon ^{[3
]}

Chae, Geesung ^{[3
]}

Jung, Yeon Sik ^{[1
]}

机构：

[1] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea

[2] ETRI, RFID USN Res Dept, Taejon 305700, South Korea

[3] LG Display Co Ltd, Mat R&D Dept, Paju Si 413811, Gyeonggi Do, South Korea

来源：

ADVANCED MATERIALS | 2012年 / 24卷 / 26期

关键词：

nanotransfer printing; soft lithography; block copolymers; self-assembly; polydimethylsiloxane; BLOCK-COPOLYMERS; NANOFABRICATION; PATTERNS; ARRAYS; NANOSTRUCTURES; GRAPHOEPITAXY; LITHOGRAPHY; SURFACES; FEATURES; DENSITY;

D O I：

10.1002/adma.201200356

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

An extraordinarily facile sub-10 nm fabrication method using the synergic combination of nanotransfer printing and the directed self-assembly of block copolymers is introduced. The approach is realized by achieving the uniform self-assembly of polydimethylsiloxane (PDMS)-containing block copolymers on a PDMS mold through the stabilization of the block copolymer thin films. This simple printing method can be applied on oxides, metals, polymers, and non-planar substrates without pretreatments. The fabrication of well-aligned metallic and polymeric functional nanostructures and crossed wire structures is also presented. © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

引用

页码：3526 / 3531

页数：6

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