Initial evaluation of a valved Te source for MBE growth of HgCdTe

被引:1
作者
Edwall, DD
Young, DB
Chen, AC
Zandian, M
Arias, JM
Dlugosch, B
Priddy, S
机构
[1] Rockwell Int Corp, Ctr Sci, Thousand Oaks, CA 91360 USA
[2] EPI MBE Prod Grp, St Paul, MN 55127 USA
关键词
HgCdTe; molecular beam epitaxy (MBE); valved source;
D O I
10.1007/s11664-999-0063-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Initial results using a valved Te source for molecular beam epitaxial growth of Hg1-xCdxTe are described. Unlike the case for a conventional Knudsen effusion cell where the flux is controlled primarily by temperature, flux from the valved source is controlled primarily by a variable orifice capable of good closure so that the cell temperature can be fixed at the operating temperature. Operating characteristics of the source are described, and include being able to nearly instantaneously change the flux magnitude at will. Using the source for HgCdTe growth has resulted in promising composition reproducibility improvement in initial growth runs.
引用
收藏
页码:740 / 742
页数:3
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