Thermal stability of hard TiN/SiNx multilayer coatings with an equiaxed microstructure

被引:49
作者
Chen, YH
Guruz, M
Chung, YW [1 ]
Keer, LM
机构
[1] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
[2] Northwestern Univ, Dept Mech Engn, Evanston, IL 60208 USA
基金
美国国家科学基金会;
关键词
sputtering; multilayer coatings; nanolayer; microstructure; thermal stability;
D O I
10.1016/S0257-8972(02)00023-3
中图分类号
TB3 [工程材料学];
学科分类号
0805 [材料科学与工程]; 080502 [材料学];
摘要
Hard TiN/SiNx multilayer coatings with an equiaxed microstructure were prepared using a dual-cathode unbalanced reactive-magnetron sputtering system. These multilayer coatings were then annealed at 1000 degreesC for 1 h in vacuum. These TiN/SiNx multilayer coatings before and after annealing were characterized at room temperature and compared in terms of microstructure and mechanical properties. X-Ray diffraction and cross-sectional transmission electron microscopy studies showed that the layer structure of these coatings is preserved after annealing at 1000 degreesC when the SiNx layer thickness is 0.8 nm or greater. The high hardness of these multilayer coatings is either maintained or improved after annealing. Therefore. with proper control of the SiNx thickness. TiN/SiNx multilayer coatings demonstrate excellent thermal stability and are potential candidates for high-temperature tribological applications. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:162 / 166
页数:5
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