Formation of ⟨001⟩-aligned nano-scale pores on (001) n-InP surfaces by photoelectrochemical anodization in HCl

被引:66
作者
Hamamatsu, A
Kaneshiro, C
Fujikura, H
Hasegawa, H
机构
[1] Hokkaido Univ, RCIQE, Kita Ku, Sapporo, Hokkaido 0608628, Japan
[2] Hokkaido Univ, Grad Sch Elect & Informat Engn, Kita Ku, Sapporo, Hokkaido 0608628, Japan
来源
JOURNAL OF ELECTROANALYTICAL CHEMISTRY | 1999年 / 473卷 / 1-2期
关键词
anodization; porous semiconductors; pores; InP; nanostructures; photoluminescence;
D O I
10.1016/S0022-0728(99)00107-2
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
[001]-oriented nanometer sized straight pores without branches were formed for the first time on (001) n-type InP surfaces by photoelectrochemical anodic reaction in HCl. The pore diameter, wall thickness and pore length could be changed in the ranges of 110-250 nm, 16-50 nm and 17-80 mm, respectively, by changing the anodizing overpotential and time. Based on the diffusion limited model for porous Si formation, the formation of [001]-aligned straight pores without branches on n-type InP was explained in terms of the short lifetime of holes combined with the presence of a strong electric field at the pore tip. Contrary to the expectation of blue-shifted photoluminescence (PL) emission due to quantum confinement at pore walls, porous (001) InP samples exhibited intense red-shifted PL peaks. This was explained by formation of a set of well defined new surface state levels on the anodized wall surfaces of pores. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:223 / 229
页数:7
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