Effects of process parameters on structure and magnetic properties of sputtered Ni-Zn ferrite thin films

被引：28

作者：

Lee, JS ^{[1
]}

Lee, BI ^{[1
]}

Joo, SK ^{[1
]}

机构：

[1] Seoul Natl Univ, Coll Engn, Sch MS&E, Kwanak Ku, Seoul 151742, South Korea

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1999年 / 35卷 / 05期

关键词：

Ni-Zn ferrite; spinel structure; sputtering; thin film;

D O I：

10.1109/20.800542

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Ni-Zn ferrite thin films were prepared by RF magnetron sputtering tit room temperature. The structure and magnetic properties of the as-deposited films were investigated as a function of oxygen partial pressure, working pressure and RF power. Deposition conditions greatly affect the crystallinity and magnetic properties of the Ni-Zn ferrite thin films. Ni-Zn ferrite thin films with spinel structure could be obtained by adjusting the process parameters without substrate heating or post heat treatment. The Ni-Zn ferrite thin film deposited with the optimized condition at room temperature showed saturation magnetization of 170 emu/cm(3) and coercivity of 35 Oe.

引用

页码：3415 / 3417

页数：3

共 8 条

[1] PREFERRED ORIENTATION AND MICROSTRUCTURE OF NI-ZN-CU FERRITE THIN-FILMS DEPOSITED BY RF MAGNETRON SPUTTERING [J].

CHO, HS ;

KIM, MH ;

KIM, HJ .

JOURNAL OF MATERIALS RESEARCH, 1994, 9 (09) :2425-2433

[2] EFFECTS OF OXYGEN PARTIAL-PRESSURE ON THE CRYSTALLOGRAPHIC STRUCTURE OF MN-ZN FERRITE THIN-FILMS DEPOSITED BY ION-BEAM SPUTTERING [J].

CHO, HS ;

HA, SK ;

KIM, HJ .

SURFACE & COATINGS TECHNOLOGY, 1994, 68 :279-284

[3]

ITOH H, 1986, J MATER SCI, V21, P3677, DOI 10.1007/BF02403020

[4] SPUTTER DEPOSITION AND MAGNETIC-PROPERTIES OF MN-ZN FERRITE FILMS COMPOSED OF (111) PLANE ORIENTED CRYSTALLITES [J].

MATSUOKA, M ;

MATSUDA, Y ;

HOSHI, Y ;

NAOE, M .

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1986, 54-7 :1603-1604

[5] DEPOSITION OF ZINC FERRITE (ZNXFE3-XO4) FILMS BY PULSED LASER EVAPORATION PROCESS [J].

OGALE, SB ;

NAWATHEY, R .

JOURNAL OF APPLIED PHYSICS, 1989, 65 (03) :1367-1369

[6]

PULLIAM CR, 1967, J APPL PHYS, V38, P1120

[7] NiZn ferrite thin films prepared by facing target sputtering [J].

Qian, ZH ;

Wang, G ;

Sivertsen, JM ;

Judy, JH .

IEEE TRANSACTIONS ON MAGNETICS, 1997, 33 (05) :3748-3750

[8]

ZUZUKI Y, 1996, APPL PHYS LETT, V68, P714

← 1 →