The influence of enhanced nucleation on thin-film growth

被引：14

作者：

Breeman, M ^{[1
]}

Michely, T ^{[1
]}

Comsa, G ^{[1
]}

机构：

[1] FORSCHUNGSZENTRUM JULICH, FORSCHUNGSZENTRUM, INST GRENZFLACHENFORSCH & VAKUUMPHYS, D-52425 JULICH, GERMANY

来源：

SURFACE SCIENCE | 1997年 / 370卷 / 01期

关键词：

atomistic dynamics; computer simulations; epitaxy; growth; nucleation; surface roughening; surface structure; morphology; roughness; and topography;

D O I：

10.1016/S0039-6028(96)01130-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We have used kinetic Monte Carlo simulations to study the influence of enhanced nucleation on the growth of epitaxial thin films. Enhanced nucleation was achieved by depositing four-atom clusters in addition to single atoms. The influence of this additional process on the island density, the island size distribution and the surface morphology are investigated as a function of the height of the Ehrlich-Schwoebel barrier for interlayer diffusion.

引用

页码：L193 / L200

页数：8

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