Chemical surface modification on polytetrafluoroethylene films by vacuum ultraviolet excimer lamp irradiation in ammonia gas atmosphere

被引：35

作者：

Heitz, J ^{[1
]}

Niino, H ^{[1
]}

Yabe, A ^{[1
]}

机构：

[1] JOHANNES KEPLER UNIV,DEPT APPL PHYS,A-4040 LINZ,AUSTRIA

来源：

APPLIED PHYSICS LETTERS | 1996年 / 68卷 / 19期

关键词：

D O I：

10.1063/1.116269

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Irradiation of polytetrafluoroethylene films with vacuum UV light in an ammonia gas atmosphere resulted in a hydrophilic surface, where abstraction of fluorine atoms, and introduction of nitrogen, oxygen, and hydrogen atoms occurred. We used Kr-2* and Xe-2* excimer lamps at wavelength of 146 and 172 nm, respectively. The reaction mechanism for chemical surface modification is discussed on the basis of x-ray photoelectron spectroscopy, secondary ion mass spectroscopy, and attenuated total reflection Fourier transform infrared spectroscopy analyses. (C) 1996 American Institute of Physics.

引用

页码：2648 / 2650

页数：3

共 21 条

[1] RAPID PHOTOCHEMICAL DEPOSITION OF SILICON DIOXIDE FILMS USING AN EXCIMER LAMP [J].