High-T-c SQUIDs on silicon substrates

被引:2
作者
Seidel, P
Linzen, S
Schmidl, F
Cihar, R
机构
[1] Inst. für Festkörperphysik, Friedrich-Schiller-Univ. Jena, 07743 Jena
来源
JOURNAL DE PHYSIQUE IV | 1996年 / 6卷 / C3期
关键词
D O I
10.1051/jp4:1996355
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We have developed high-T-c SQUIDs based on Josephson step-edge junctions on silicon substrates. The SQUIDs show a transfer function up to 150 mu V/Phi(0) and a white noise of 10(-5)Phi(0)/Hz(1/2) at 50 K. During the last three years extensive investigations of the growth of YBCO. buffer and passivation layers as well as step-preparation and patterning processes were necessary to find a standard preparation process comparable to the preparation of Josephson step-edge junctions on classical substrates. In this paper we give an overview on the technical solutions based on the laser deposition of YBCO/buffer multilayer systems and we discuss Josephson junction and SQUID properties depending on different device preparation processes.
引用
收藏
页码:361 / 365
页数:5
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