Suitability of new polymer materials with adjustable glass temperature for nano-imprinting

被引：20

作者：

Pfeiffer, K

Bleidiessel, G

Gruetzner, G

Schulz, H

Hoffmann, T

Scheer, HC

Torres, CMS

Ahopelto, J

机构：

[1] Micro Resist Technology GmbH, D-12555 Berlin

[2] Dept. of Electrical Engineering, University of Wuppertal, D-42097 Wuppertal

[3] VTT Electronics, FIN-02150 Espoo

来源：

MICROELECTRONIC ENGINEERING | 1999年 / 46卷 / 1-4期

关键词：

D O I：

10.1016/S0167-9317(99)00126-4

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A new class of copolymers potentially suitable for an imprint process is investigated. They are composed of methyl-methacrylate and a methacrylic acid, where the acid component increases the glass temperature and thus the thermal stability. The results obtained are compared to previous experiments with a methyl/butyl acrylate and the suitability for an imprint process is discussed. A modified processing sequence is proposed, where pressure is applied during the heating phase, resulting in superior imprint quality of, for example, periodic patterns.

引用

页码：431 / 434

页数：4