Wavelength selection in unstable homoepitaxial step flow growth

被引：49

作者：

Maroutian, T ^{[1
]}

Douillard, L ^{[1
]}

Ernst, HJ ^{[1
]}

机构：

[1] CEA Saclay, DSM, Drecam, Srsim, F-91191 Gif Sur Yvette, France

来源：

PHYSICAL REVIEW LETTERS | 1999年 / 83卷 / 21期

关键词：

D O I：

10.1103/PhysRevLett.83.4353

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The growth of Cu on a vicinal Cu surface is investigated using variable temperature scanning tunneling microscopy. A meandering instability caused by the step edge barrier for diffusion leads to a lateral patterning of the surface with a temperature-dependent, distinctive wavelength. This length scale is set by nucleation of one-dimensional islands at step edges. In the temperature range covered by our experiment (230 to 400 K) a specific slope of the growth features within the plane of the surface is selected. This may point to a pronounced spatial anisotropy of the step edge barrier.

引用

页码：4353 / 4356

页数：4

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