共 11 条
[1]
Allen R. D., 1995, J PHOTOPOLYM SCI TEC, V8, P623
[2]
NEW PROCEDURES FOR SELECTIVELY PROTECTED CHOLIC-ACID DERIVATIVES - REGIOSELECTIVE PROTECTION OF THE 12-ALPHA-OH GROUP, AND TERT-BUTYL ESTERIFICATION OF THE CARBOXYL GROUP
[J].
JOURNAL OF THE CHEMICAL SOCIETY-PERKIN TRANSACTIONS 1,
1990, (08)
:2245-2250
[3]
Recent advances in 193 nm single-layer photoresists based on alternating copolymers of cycloolefins
[J].
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIV,
1997, 3049
:84-91
[5]
A NOVEL-APPROACH TO ORTHO-NITROBENZYL PHOTOCHEMISTRY FOR RESISTS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1981, 19 (04)
:1338-1342
[6]
Silverstein R.M., 1991, SPECTROSCOPIC IDENTI
[10]
Evaluation of cycloolefin-maleic anhydride alternating copolymers as single-layer photoresists for 193 nn photolithography
[J].
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIII,
1996, 2724
:355-364