NOVOLAC-BASED PHOTORESISTS COMBINING CHEMICAL AMPLIFICATION AND DISSOLUTION INHIBITION

被引：34

作者：

OBRIEN, MJ

机构：

来源：

POLYMER ENGINEERING AND SCIENCE | 1989年 / 29卷 / 13期

关键词：

D O I：

10.1002/pen.760291303

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：846 / 849

页数：4

共 14 条

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