Morphological selection of electroless metal deposits on silicon in aqueous fluoride solution

被引：81

作者：

Peng, KQ ^{[1
]}

Zhu, J ^{[1
]}

机构：

[1] Tsinghua Univ, Dept Mat Sci & Engn, Beijing 100084, Peoples R China

来源：

ELECTROCHIMICA ACTA | 2004年 / 49卷 / 16期

基金：

中国国家自然科学基金;

关键词：

electroless deposition; dendrite;

D O I：

10.1016/j.electacta.2004.02.009

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Well-defined silver and gold dendrites are prepared on silicon substrates in aqueous fluoride acid solution containing AgNO3 and KAuCl4, respectively. In cases of electroless platinum and copper deposition in fluoride acid solution, no corresponding metal dendrites but platinum microcrystallines and copper granular-crystallines are formed. Our experiments found that the morphological selection of electroless metal deposits is related to the microstructure of etched silicon. A possible template mechanism and affecting factors for the morphological selection of electroless metal deposits are discussed. (C) 2004 Elsevier Ltd. All rights reserved.

引用

页码：2563 / 2568

页数：6

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