Electrically active defects in irradiated 4H-SiC

被引:89
作者
David, ML
Alfieri, G
Monakhov, EM
Hallén, A
Blanchard, C
Svensson, BG
Barbot, JF
机构
[1] Univ Poitiers, UMR6630, Met Phys Lab, F-86962 Futuroscope, France
[2] Univ Oslo, Phys Dept Phys Elect, N-0316 Oslo, Norway
[3] Royal Inst Technol, SE-16440 Kista, Sweden
关键词
D O I
10.1063/1.1689731
中图分类号
O59 [应用物理学];
学科分类号
摘要
4H-SiC epilayers were irradiated with either protons or electrons and electrically active defects were studied by means of deep level transient spectroscopy. Motion of defects has been found to occur at temperature as low as 350-400 K. Indeed, the application of an electric field has been found to enhance modifications in defect concentrations that can also occur during long time annealing at elevated temperature. Two levels have been revealed and labeled B and M. Two other levels, referred to as S-1 and S-2 and located at 0.40 and 0.71 eV below the conduction band edge have been studied in detail (capture cross sections, profiling, formation energy, activation energy during annealing). The S-1 and S-2 levels have been found to exhibit a one to one relation and are proposed to be two charge states of the same acceptor center, labeled the S center. (C) 2004 American Institute of Physics.
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页码:4728 / 4733
页数:6
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