Fabrication of InP-based InGaAs ridge quantum wires utilizing selective molecular beam epitaxial growth on (311)A facets

InP-based InGaAs/InAlAs ridge quantum wires were successfully fabricated by our new approach using selective molecular beam epitaxy (MBE). As the starting structures, array of InGaAs ridge structures composed of smooth (311)A facets were formed by MBE on mesa-patterned InP substrates. Prior to actual fabrication of the wires, MBE growth characteristics of In0.53Ga0.47As and In0.52Al0.48As layers on the starting structure were studied in detail. The results of growth experiments were then successfully applied to the fabrication of InGaAs ridge quantum wires with high spatial uniformity. Low temperature cathodoluminescence spectrum measured in response to spot excitation of wire region showed a strong light emission whose analysis indicated that it originates from InGaAs ridge quantum wire itself. In photoluminescence measurements, the emission from the wire had strong intensity even at room temperature, indicating that the wire crystal possesses excellent bulk and interface quality, and are largely free from nonradiative recombination centers.