Structural disorders in an amorphous HfO2 film probed by x-ray absorption fine structure analysis

被引：25

作者：

Cho, Deok-Yong ^{[1
]}

Park, Tae Joo ^{[1
]}

Na, Kwang Duk ^{[1
]}

Kim, Jeong Hwan ^{[1
]}

Hwang, Cheol Seong ^{[1
]}

机构：

[1] Seoul Natl Univ, Dept Mat Sci & Engn, Interuniv Semicond Res Ctr, Seoul 151744, South Korea

来源：

PHYSICAL REVIEW B | 2008年 / 78卷 / 13期

关键词：

D O I：

10.1103/PhysRevB.78.132102

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The local structural order of amorphous HfO2 films (a-HfO2) was examined using Hf L-3-edge x-ray absorption spectroscopy and fine structure analyses. The fine structure simulation successfully reproduced the spectral evolution of the crystalline-to-amorphous phase transition by reducing the characteristic radius for atomic ordering to similar to 3.5 A. Detailed path-by-path analyses further showed that the vibrational displacement of oxygen atoms in a-HfO2 films is highly anisotropic showing mainly lateral dispersion perpendicular to a Hf-O bond. This anisotropic structural disorder is responsible for enhancing the dielectric constant accompanying phonon mode softening in the a-HfO2 film.

引用

页数：4

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