Binary blends of diblock copolymers as an effective route to multiple length scales in perfect directed self-assembly of diblock copolymer thin films

被引：23

作者：

Edwards, EW

Stoykovich, MP

Nealey, PF ^{[1
]}

Solak, HH

机构：

[1] Univ Wisconsin, Dept Biol & Chem Engn, Madison, WI 53706 USA

[2] Univ Wisconsin, Ctr Nanotechnol, Madison, WI 53706 USA

[3] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2006年 / 24卷 / 01期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1116/1.2151226

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The directed assembly of binary blends of diblock copolymers on chemically nanopatterned substrates was investigated as a means to pattern features of controlled dimensions at the nanoscale. The lamella-forming blends assembled without defects and in registration with underlying chemical surface patterns that had periods L-S that were commensurate with the bulk lamellar period of the blends L-B. L-B was tuned between the bulk lamellar periods of the block copolymers L-O1 and L-O2. (c) 2006 American Vacuum Society.

引用

收藏

页码：340 / 344

页数：5

相关论文

共 28 条

[1] Macroscopic orientation of block copolymer cylinders in single-layer films by shearing [J].

Angelescu, DE ;

Waller, JH ;

Adamson, DH ;

Deshpande, P ;

Chou, SY ;

Register, RA ;

Chaikin, PM .

ADVANCED MATERIALS, 2004, 16 (19) :1736-+

[2] Block copolymers - Designer soft materials [J].

Bates, FS ;

Fredrickson, GH .

PHYSICS TODAY, 1999, 52 (02) :32-38

[3] Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication [J].

Black, CT ;

Guarini, KW ;

Milkove, KR ;

Baker, SM ;

Russell, TP ;

Tuominen, MT .

APPLIED PHYSICS LETTERS, 2001, 79 (03) :409-411

[4] High-capacity, self-assembled metal-oxide-semiconductor decoupling capacitors [J].

Black, CT ;

Guarini, KW ;

Zhang, Y ;

Kim, HJ ;

Benedict, J ;

Sikorski, E ;

Babich, IV ;

Milkove, KR .

IEEE ELECTRON DEVICE LETTERS, 2004, 25 (09) :622-624

[5] Precise control over molecular dimensions of block-copolymer domains using the interfacial energy of chemically nanopatterned substrates [J].

Edwards, EW ;

Montague, MF ;

Solak, HH ;

Hawker, CJ ;

Nealey, PF .

ADVANCED MATERIALS, 2004, 16 (15) :1315-+

[6] Reducing substrate pinning of block copolymer microdomains with a buffer layer of polymer brushes [J].

Harrison, C ;

Chaikin, PM ;

Huse, DA ;

Register, RA ;

Adamson, DH ;

Daniel, A ;

Huang, E ;

Mansky, P ;

Russell, TP ;

Hawker, CJ ;

Egolf, DA ;

Melnikov, IV ;

Bodenschatz, E .

MACROMOLECULES, 2000, 33 (03) :857-865

[7] GENERALIZED VIEW OF MOLECULAR-WEIGHT DEPENDENCE OF MICRODOMAIN SIZE OF BLOCK POLYMERS - APPRAISAL OF HADZIIOANNOU-SKOULIOS DATA ON BINARY-MIXTURES OF BLOCK POLYMERS [J].

HASHIMOTO, T .

MACROMOLECULES, 1982, 15 (06) :1548-1553

[8] Highly oriented and ordered arrays from block copolymers via solvent evaporation [J].

Kim, SH ;

Misner, MJ ;

Xu, T ;

Kimura, M ;

Russell, TP .

ADVANCED MATERIALS, 2004, 16 (03) :226-+

[9] Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates [J].

Kim, SO ;

Solak, HH ;

Stoykovich, MP ;

Ferrier, NJ ;

de Pablo, JJ ;

Nealey, PF .

NATURE, 2003, 424 (6947) :411-414

[10] Ordering in blends of diblock copolymers [J].

Koneripalli, N ;

Levicky, R ;

Bates, FS ;

Matsen, MW ;

Satija, SK ;

Ankner, J ;

Kaiser, H .

MACROMOLECULES, 1998, 31 (11) :3498-3508