Vacuum shear force microscopy application to high resolution work

被引：15

作者：

Polonski, VV

Yamamoto, Y

White, JD

Kourogi, M

Ohtsu, M

机构：

[1] Tokyo Inst Technol, Dept Appl Elect, Midori Ku, Yokohama, Kanagawa 2268502, Japan

[2] Univ Telekom Multimedia, Fac Engn, Melaka 75450, Malaysia

[3] Japan Sci & Technol Corp, ERATO, Ohtsu Localized Photon Project, Tokyo 1940004, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1999年 / 38卷 / 7B期

关键词：

shear-force microscopy; nanofabrication; near-field optics; vacuum; scanning microscopy;

D O I：

10.1143/JJAP.38.L826

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A new technique-Vacuum Shear Force Microscopy (VSFM)- is introduced as a reliable method for maintaining a constant separation between a probe and sample. Elimination of many of the instabilities observed when applying the shear force mechanism to imaging under ambient conditions, allows for routine nanometer lateral and sub-nanometer normal resolution. In this paper this technique is applied, firstly, to the imaging of microtubules (biology) and, secondly, to the patterning and subsequent imaging of nanoscale metal lines (nanofabrication).

引用

页码：L826 / L829

页数：4

共 14 条

[1] Vacuum near-field scanning optical microscope for variable cryogenic temperatures [J].