Absolute total and partial electron ionization cross sections of C2F6

被引:14
作者
Basner, R
Schmidt, M
Denisov, E
Lopata, P
Becker, K
Deutsch, H
机构
[1] Univ Greifswald, Inst Niedertemp Plasmaphys, D-17489 Greifswald, Germany
[2] Stevens Inst Technol, Dept Phys & Engn Phys, Hoboken, NJ 07030 USA
[3] Univ Greifswald, Inst Phys, D-17489 Greifswald, Germany
关键词
tetrafluoromethane; hexafluoroethane; electron ionization; cross sections; plasma etching;
D O I
10.1016/S1387-3806(02)00541-9
中图分类号
O64 [物理化学(理论化学)、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号
070203 ; 070304 ; 081704 ; 1406 ;
摘要
We measured absolute partial and total cross sections for the electron ionization of hexafluoroethane (C2F6) from threshold to 900 eV using a time-of-flight mass spectrometer (TOF-MS), which can be operated in a linear and in a reflection mode. Measurements were also made for tetrafluoromethane (CF4), which is perhaps the most thoroughly investigated complex polyatomic molecule in terms of ionization cross sections, in an effort to demonstrate the reliable performance of our apparatus. Our measurements for both CF4 and C2F6 are compared with other available experimental data and with calculated cross sections. (Int J Mass Spectrom 214 (2002) 365-374) (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:365 / 374
页数:10
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