Native defects in InxGa1-xN alloys

被引:10
作者
Li, SX
Yu, KM
Wu, J
Jones, RE
Walukiewicz, W [1 ]
Ager, JW
Shan, W
Haller, EE
Lu, H
Schaff, WJ
机构
[1] Lawrence Berkeley Lab, Div Mat Sci, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
[3] Cornell Univ, Dept Elect & Comp Engn, Ithaca, NY 14853 USA
关键词
InN; InGaN; native defects; Fermi stabilization energy;
D O I
10.1016/j.physb.2005.12.111
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
To elucidate the role of native defects in determining the electronic and optical properties of In1-xGaxN, energetic particle irradiation (electrons, protons, and He-4(+)) has been used to intentionally introduce point defects into InxGa1-xN alloys. Optical absorption, Hall effect, and capacitance-voltage (CV) measurements are used to evaluate properties of these materials. Irradiation produces donor-like defects in InxGa1-xN with x > 0.34, while acceptor-like defects form in Ga-rich InxGa1-xN (x < 0.34). A sufficiently high irradiation dose pins the Fermi level at the Fermi level stabilization energy (E-FS), as predicted by the amphoteric defect model. Pinning of the Fermi level at this energy is also responsible for the surface electron accumulation effect in unirradiated In-rich In1-xGaxN. (c) 2005 Published by Elsevier B.V.
引用
收藏
页码:432 / 435
页数:4
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