Effect of the Mo atom flow on the molybdenum growth on TiO2(110) surface

被引：16

作者：

Domenichini, B

Blondeau-Patissier, V

Casanove, MJ

Lian, GD

Bourgeois, S

机构：

[1] Univ Bourgogne, Lab Rech React Solides, UMR 5613, CNRS, F-21078 Dijon, France

[2] CNRS, CEMES, F-31055 Toulouse, France

[3] Univ Kentucky, Dept Chem & Mat Engn, Lexington, KY 40506 USA

来源：

JOURNAL OF CRYSTAL GROWTH | 2004年 / 263卷 / 1-4期

关键词：

high resolution transmission electron microscopy; surface chemical reaction; XPS; molybdenum; titanium oxide;

D O I：

10.1016/j.jcrysgro.2003.11.049

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

Molybdenum has been deposited at room temperature on stoichiometric TiO2 (110) surfaces with two deposition rates: 0.1 equivalent monolayer (eqML) and 1.5 eqML min(-1). X-ray photoelectron spectroscopy and high-resolution transmission electron microscopy studies clearly reveal an effect of the deposition rate upon the growth mode and the interfacial reaction. Indeed, whereas a strong interfacial reaction between Mo and TiO2 involves a Stranski-Krastanov growth mode with the formation of amorphous molybdenum oxide monolayers for the lowest deposition rate, no reaction can be observed for the highest deposition rate. Moreover in this latter case, the growth mode seems to be a 3D one. These differences are discussed from a pure kinetics point of view. (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：256 / 262

页数：7

共 17 条

[1] Molybdenum thin-film growth on rutile titanium dioxide (110) [J].