Numerical analysis of surface wave excitation in a planar-type nonmagnetized plasma processing device

被引:26
作者
Chen, Q [1 ]
Aoyagi, PH [1 ]
Katsurai, M [1 ]
机构
[1] Univ Tokyo, Dept Elect Engn, Tokyo 1138656, Japan
关键词
FDTD; plasma processing; surface wave propagation;
D O I
10.1109/27.763108
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Two-dimensional numerical simulations based on the finite-difference time-domain approximation to Maxwell's equations coupled with nonmagnetized cold electron plasma equations are used to study surface wave propagation in a four-layer planar type surface wave plasma processing structure (Komachi et al.) under the assumption that the plasma is overdense, Simulations are used to verify the existence of surface waves along the plasma-dielectric window interface as well as to investigate the excitation mechanism of surface waves, In addition, simulations are used to study the effect of the air gap on the electric field distribution at the plasma-dielectric window interface. It is found that metal edges located along the processing chamber wall sufficiently close to the interface are needed to excite surface waves along the interface. It is also found that the air gap layer helps achieve a more uniform electric field distribution over the processing chamber.
引用
收藏
页码:164 / 170
页数:7
相关论文
共 33 条
[1]   An FDTD formulation for dispersive media using a current density [J].
Chen, Q ;
Katsurai, M ;
Aoyagi, PH .
IEEE TRANSACTIONS ON ANTENNAS AND PROPAGATION, 1998, 46 (11) :1739-1746
[2]  
Collin R. E., 1986, FIELD THEORY GUIDED
[3]   Surface wave eigenmodes in a finite-area plane microwave plasma [J].
Ghanashev, I ;
Nagatsu, M ;
Sugai, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (1A) :337-344
[4]  
Harrington R. F., 1961, TIME HARMONIC ELECTR
[5]   GENERATION OF A SURFACE-WAVE ENHANCED PLASMA USING COAXIAL-TYPE OPEN-ENDED DIELECTRIC CAVITY [J].
KIMURA, T ;
YOSHIDA, Y ;
MIZUGUCHI, SI .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1995, 34 (8B) :L1076-L1078
[6]  
KOMACHI K, 1990, J MICROWAVE POWER EE, V25, P236
[7]   AFFECTING FACTORS ON SURFACE-WAVE-PRODUCED PLASMA [J].
KOMACHI, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (01) :164-167
[8]  
KOMACHI K, 1989, J MICROWAVE POWER EE, V24, P140
[9]   ELECTRIC-FIELD IN SURFACE-WAVE-PRODUCED PLASMAS [J].
KOMACHI, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (03) :769-771
[10]   RESIST ASHING AT ROOM-TEMPERATURE USING SURFACE-WAVE-PRODUCED PLASMAS [J].
KOMACHI, K ;
KOBAYASHI, S ;
ARAKI, H ;
TANI, T .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1991, 138 (12) :L76-L78