Surface/interface-roughness-induced demagnetizing effect in thin magnetic films

被引:80
作者
Zhao, YP [1 ]
Palasantzas, G
Wang, GC
De Hosson, JTM
机构
[1] Rensselaer Polytech Inst, Dept Phys Appl Phys & Astron, Troy, NY 12180 USA
[2] Rensselaer Polytech Inst, Ctr Integrated Elect & Elect Mfg, Troy, NY 12180 USA
[3] Univ Groningen, Ctr Mat Sci, Dept Appl Phys, NL-9747 AG Groningen, Netherlands
来源
PHYSICAL REVIEW B | 1999年 / 60卷 / 02期
关键词
D O I
10.1103/PhysRevB.60.1216
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We study the influence of surface/interface roughness on the demagnetizing factor of a thin magnetic film with a single or a double boundary of self-affine, mound or anisotropic roughness. For a film with a single self-affine rough boundary, the in-plane demagnetizing factor N-xx(yy) is proportional to the interface width w square and to the leading order is inversely proportional to the lateral correlation length xi. The roughness exponent alpha is also shown to greatly affect N-xx(yy). For a film with a single mound boundary, N-xx(yy) is inversely proportional to the apparent correlation length, and also depends on the ratio of the two different lateral lengths: the average mound separation lambda and the randomness correlation length zeta. It is also shown that an anisotropic surface morphology can induce anisotropic in-plane demagnetizing factors. The demagnetizing anisotropy can be magnified by a morphological anisotropy. Furthermore, we consider films with two rough boundaries. Besides a general formalism derived for the demagnetizing factor, we investigate how the cross correlation of the two rough boundaries affects the in-plane demagnetizing factors. Connections between the demagnetizing factor and thin-film growth mechanisms are also discussed.
引用
收藏
页码:1216 / 1226
页数:11
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