Study of physical and photocatalytic properties of titanium dioxide thin films prepared from complex precursors by chemical vapour deposition

被引：84

作者：

Bessergenev, VG

Pereira, RJF

Mateus, MC

Khmelinskii, L

Vasconcelos, DA

Nicula, R

Burkel, E

do Rego, AMB

Saprykin, AI

机构：

[1] Univ Algarve, FCT, P-8005139 Faro, Portugal

[2] Univ Rostock, FB Phys, D-18055 Rostock, Germany

[3] Ctr Quim Fis Mol, IST, P-1049001 Lisbon, Portugal

[4] Russian Acad Sci, Inst Inorgan Chem, Novosibirsk 630090, Russia

来源：

THIN SOLID FILMS | 2006年 / 503卷 / 1-2期

关键词：

thin films; titanium dioxide; CVD; photocatalysis;

D O I：

10.1016/j.tsf.2005.10.046

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Titanium dioxide (TiO2) thin films were prepared using Titanium [bis(dipiraloymethanate) diisopropoxide] (Ti(dpm)(2)(OPri)(2)) and Titanium isopropoxide (Ti(OPri)(4)) complex compound precursors by Chemical Vapour Deposition (CVD) and photo-assisted CVD. Structural information on TiO2 thin films was obtained in synchrotron radiation experiments: high-resolution Grazing Incidence X-ray Diffraction (GIXRD) and 0-20 XRD experiments were performed on the high-resolution powder diffractometer at the Hamburg Synchrotron Laboratory. Chemical composition of thin films was Studied by high-resolution Laser Ionization Mass Spectrometry technique, surface composition by X-ray Photoelectron Spectroscopy, and surface morphology by Atomic Force Microscopy. Photocatalytic activity of TiO2 thin films was studied using a photocatalytic reactor. The fungicide Fenarimol was chosen as chemical indicator and its degradation kinetics was followed by High Performance Liquid Chromatography. (c) 2005 Elsevier B.V. All rights reserved.

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页码：29 / 39

页数：11

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