Single-Step Process for the Deposition of High Water Contact Angle and High Water Sliding Angle Surfaces by Atmospheric Pressure Dielectric Barrier Discharge

被引:41
作者
Boscher, Nicolas D. [1 ]
Duday, David [1 ]
Verdier, Stephane [2 ]
Choquet, Patrick [1 ]
机构
[1] Ctr Rech Publ Gabriel Lippmann, Sci & Anal Mat Dept, L-4422 Belvaux, Luxembourg
[2] Eurofoil Innovat Ctr, Innovat Ctr, L-4422 Eurofoil, Belvaux, Luxembourg
关键词
superhydrophobic surfaces; plasma-polymerized hexamethyldisiloxane thin films; atmospheric pressure dielectric barrier discharge; dual-scale roughness; water adhesion; CHEMICAL-VAPOR-DEPOSITION; THIN-FILMS; SUPERHYDROPHOBIC SURFACES; ALUMINUM FOIL; FABRICATION; XPS; WETTABILITY; CORROSION; ADHESION;
D O I
10.1021/am302795v
中图分类号
TB3 [工程材料学];
学科分类号
082905 [生物质能源与材料];
摘要
Fluorine-free surfaces with high water contact angle (WCA) and high adhesion force to water are prepared by the atmospheric pressure dielectric barrier discharge (AP-DBD) of hexamethyldisiloxane on cold rolled aluminum foil. Water droplets, which remained on the plasma-polymerized hexamethyldisiloxane (ppHMDSO) surface with contact angle of 1550, do not slide even when the surface is tilted vertically or turned upside down. Scanning electron microscopy, atomic force microscopy and confocal microscopy highlight the importance of the dual-scale roughness of the ppHMDSO surface. The "sticky" high WCA property is achieved only when the nanometer scale particles generated during the AP-DBD process are present at the surface of the film and combine to the micrometer scale rolling lines of the aluminum substrate.
引用
收藏
页码:1053 / 1060
页数:8
相关论文
共 43 条
[1]
A study of HMDSO/O2 plasma deposits using a high-sensitivity and -energy resolution XPS instrument:: curve fitting of the Si 2p core level [J].
Alexander, MR ;
Short, RD ;
Jones, FR ;
Michaeli, W ;
Blomfield, CJ .
APPLIED SURFACE SCIENCE, 1999, 137 (1-4) :179-183
[2]
[Anonymous], APPL PHYS LETT
[3]
Deposition of polysiloxane-like nanofilms onto an aluminium alloy by plasma polymerized hexamethyldisiloxane: characterization by XPS and contact angle measurements [J].
Azioune, A. ;
Marcozzi, M. ;
Revello, V. ;
Pireaux, J. J. .
SURFACE AND INTERFACE ANALYSIS, 2007, 39 (07) :615-623
[4]
Patterning of superhydrophobic paper to control the mobility of micro-liter drops for two-dimensional lab-on-paper applications [J].
Balu, Balamurali ;
Berry, Adam D. ;
Hess, Dennis W. ;
Breedveld, Victor .
LAB ON A CHIP, 2009, 9 (21) :3066-3075
[5]
Nucleation and aerosol processing in atmospheric pressure electrical discharges: powders production, coatings and filtration [J].
Borra, JP .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2006, 39 (02) :R19-R54
[6]
Atmospheric pressure chemical vapor deposition of WSe2 thin films on glass -: highly hydrophobic sticky surfaces [J].
Boscher, ND ;
Carmalt, CJ ;
Parkin, IP .
JOURNAL OF MATERIALS CHEMISTRY, 2006, 16 (01) :122-127
[7]
Influence of cyclic organosilicon precursors on the corrosion of aluminium coated sheet by atmospheric pressure dielectric barrier discharge [J].
Boscher, Nicolas D. ;
Choquet, Patrick ;
Duday, David ;
Verdier, Stephane .
SURFACE & COATINGS TECHNOLOGY, 2011, 205 (23-24) :5350-5357
[8]
Chemical compositions of organosilicon thin films deposited on aluminium foil by atmospheric pressure dielectric barrier discharge and their electrochemical behaviour [J].
Boscher, Nicolas D. ;
Choquet, Patrick ;
Duday, David ;
Verdier, Stephane .
SURFACE & COATINGS TECHNOLOGY, 2010, 205 (07) :2438-2448
[9]
Advantages of a Pulsed Electrical Excitation Mode on the Corrosion Performance of Organosilicon Thin Films Deposited on Aluminium Foil by Atmospheric Pressure Dielectric Barrier Discharge [J].
Boscher, Nicolas D. ;
Choquet, Patrick ;
Duday, David ;
Verdier, Stephane .
PLASMA PROCESSES AND POLYMERS, 2010, 7 (02) :163-171
[10]
Organosilicon thin films deposited from cyclic and acyclic precursors using water as an oxidant [J].
Burkey, DD ;
Gleason, KK .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2004, 151 (05) :F105-F112