Patterned Media: Nanofabrication Challenges of Future Disk Drives

被引：51

作者：

Dobisz, Elizabeth A. ^{[1
]}

Bandic, Zvonomir Z. ^{[1
]}

Wu, Tsai-Wei ^{[1
]}

Albrecht, Thomas ^{[1
]}

机构：

[1] Hitachi Global Storage Technol, Hitachi San Jose Res Ctr, San Jose, CA 95135 USA

来源：

PROCEEDINGS OF THE IEEE | 2008年 / 96卷 / 11期

关键词：

Data storage; e-beam lithography; magnetic storage; nanofabrication; nanoimprint; nanomagnetic; patterned media;

D O I：

10.1109/JPROC.2008.2007600

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Scaling of the bit size in conventional magnetic recording media is becoming increasingly difficult due to the superparamagnetic limit. innovations in magnetic recording technology are emerging to enable the continued growth in bit areal density. Thermal stability problems of conventional granular media can be greatly helped by patterning single domain magnetic islands for each magnetic bit. Fabrication of patterned media requires application of nanoimprint lithography for high-volume production of patterned media disks and high-resolution electron beam lithography for fabrication of the nanoimprint masters. We discuss the approaches and the many challenges to the implementation of patterned media disks.

引用

页码：1836 / 1846

页数：11

共 34 条

[1] Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography [J].

Austin, MD ;

Ge, HX ;

Wu, W ;

Li, MT ;

Yu, ZN ;

Wasserman, D ;

Lyon, SA ;

Chou, SY .

APPLIED PHYSICS LETTERS, 2004, 84 (26) :5299-5301

[2] Step and flash imprint lithography: Template surface treatment and defect analysis [J].

Bailey, T ;

Choi, BJ ;

Colburn, M ;

Meissl, M ;

Shaya, S ;

Ekerdt, JG ;

Sreenivasan, SV ;

Willson, CG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06) :3572-3577

[3] Dual pass electron beam writing of bit arrays with sub-100 nm bits on imprint lithography masters for patterned media production [J].

Bogdanov, AL ;

Holmqvist, T ;

Jedrasik, P ;

Nilsson, B .

MICROELECTRONIC ENGINEERING, 2003, 67-8 :381-389

[4] Application of near-field optics to critical dimension metrology [J].

Bukofsky, SJ ;

Selberg, SA ;

Grober, RD ;

Trautman, JK .

APPLIED PHYSICS LETTERS, 1997, 70 (18) :2368-2370

[5] All-metal current-perpendicular-to-plane giant magnetoresistance sensors for narrow-track magnetic recording [J].

Childress, J. R. ;

Carey, M. J. ;

Maat, S. ;

Smith, N. ;

Fontana, R. E. ;

Druist, D. ;

Carey, K. ;

Katine, J. A. ;

Robertson, N. ;

Boone, T. D. ;

Alex, M. ;

Moore, J. ;

Tsang, C. H. .

IEEE TRANSACTIONS ON MAGNETICS, 2008, 44 (01) :90-94

[6] Ultrafast and direct imprint of nanostructures in silicon [J].

Chou, SY ;

Keimel, C ;

Gu, J .

NATURE, 2002, 417 (6891) :835-837

[7] Nanoimprint lithography [J].

Chou, SY ;

Krauss, PR ;

Renstrom, PJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :4129-4133

[8]

FONTANA RE, 2006, J APPL PHYS, V99

[9]

FUGITA J, 1996, J VAC SCI TECHNOL B, V14, P4272

[10]

Heidari B, 2005, P IEEE INT C MICR NA, P144

← 1 2 3 4 →