Atmospheric pressure chemical vapour deposition of VO2 and VO2/TiO2 films from the reaction of VOCl3, TiCl4 and water

被引：51

作者：

Qureshi, U ^{[1
]}

Manning, TD ^{[1
]}

Parkin, IP ^{[1
]}

机构：

[1] UCL, Dept Chem, London WC1H 0AJ, England

来源：

JOURNAL OF MATERIALS CHEMISTRY | 2004年 / 14卷 / 07期

关键词：

D O I：

10.1039/b316531k

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Vanadium dioxide films were deposited on glass from the APCVD reaction of VOCl3 and water at 650 degreesC. Introduction of a second precursor TiCl4 affected the growth morphology of the VO2 films but did not incorporate any detectable titanium. The films were characterised by XPS, XRD, Raman, EDAX and SEM. Interestingly the VO2 films formed in the presence of TiCl4 showed a reduction in the thermochromic switching temperature from 69 degreesC in bulk VO2 to 49 degreesC. APCVD of TiCl4/ VOCl3 at a substrate temperature of 600 and 550 degreesC afforded composite TiO2/VO2 films. These films exhibited photoinduced hydrophilicity, photocatalysis and a thermochromic switching temperature of 51 degreesC.

引用

页码：1190 / 1194

页数：5

共 23 条

[1] MECHANISMS FOR METAL-NONMETAL TRANSITIONS IN TRANSITION-METAL OXIDES AND SULFIDES [J].