Bent-beam strain sensors

被引:132
作者
Gianchandani, YB
Najafi, K
机构
[1] Ctr. for Intgd. Sensors and Circuits, University of Michigan, Ann Arbor
[2] University of California, Irvine, CA
[3] University of California, Los Angeles, CA
[4] University of Michigan, Ann Arbor, MI
[5] Dept. of Elec. Eng. and Comp. Sci., University of Michigan, Ann Arbor, MI
基金
美国国家科学基金会;
关键词
D O I
10.1109/84.485216
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We examine a new class of sensitive and compact passive strain sensors that utilize a pair of narrow bent beams with an apex at their mid-points, The narrow beams amplify and transform deformations caused by residual stress into opposing displacements of the apices, where vernier scales are positioned to quantify the deformation, An analytical method to correlate vernier readings to residual stress is outlined, and its results are corroborated by finite-element modeling, It is shown that tensile and compressive residual stress levels below 10 MPa, corresponding to strains below 6 x 10(-5), can be measured in a 1.5-mu m-thick layer of polysilicon using a pair of beams that are 2 mu m wide, 200 mu m long, and bent 0.05 radians (2.86 degrees) to the long axis of the device, Experimental data is presented from bent-beam strain sensors that were fabricated from boron-doped single crystal silicon using the dissolved wafer process and from polycrystalline silicon using surface micromachining, Measurements from these devices agree well with those obtained by other methods. [125]
引用
收藏
页码:52 / 58
页数:7
相关论文
共 18 条
[1]  
Fang W., 1994, Proceedings IEEE Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robotic Systems (Cat. No.94CH3404-1), P182, DOI 10.1109/MEMSYS.1994.555620
[2]  
GIANCHANDANI Y, 1994, TECH DIG INT EL DEV, P191
[3]   A bulk silicon dissolved wafer process for microelectromechanical devices [J].
Gianchandani, Yogesh B. ;
Najafi, Khalil .
Journal of Microelectromechanical Systems, 1992, 1 (02) :77-85
[4]  
Gianchandani Y. B., 1994, Technical Digest. Solid-State Sensor and Actuator Workshop, P116
[5]  
GOOSEN JFL, 1993, P 7 INT C SOL STAT S, P783
[6]  
Guckel H., 1992, Journal of Micromechanics and Microengineering, V2, P86, DOI 10.1088/0960-1317/2/2/004
[7]  
Lin L.-L., 1993, Proceedings. IEEE. Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.93CH3265-6), P201, DOI 10.1109/MEMSYS.1993.296922
[8]   NOVEL MICROSTRUCTURES FOR THE INSITU MEASUREMENT OF MECHANICAL-PROPERTIES OF THIN-FILMS [J].
MEHREGANY, M ;
HOWE, RT ;
SENTURIA, SD .
JOURNAL OF APPLIED PHYSICS, 1987, 62 (09) :3579-3584
[9]  
MENG Q, 1993, J MICROELECTROMECHAN, V2, P128
[10]  
Najafi K., 1989, Proceedings: IEEE Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots (IEEE Cat. No.89THO249-3), P96, DOI 10.1109/MEMSYS.1989.77969