Three-dimensional nanostructures formed by single step, two-photon exposures through elastomeric Penrose quasicrystal phase masks

被引：38

作者：

Shir, Daniel ^{[1
]}

Liao, Hongwei ^{[1
]}

Jeon, Seokwoo ^{[1
]}

Xiao, Dong ^{[2
]}

Johnson, Harley T. ^{[2
,5
,6
]}

Bogart, Gregory R. ^{[7
]}

Bogart, Katherine H. A. ^{[7
]}

Rogers, John A. ^{[1
,2
,3
,4
,5
,6
]}

机构：

[1] Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA

[2] Univ Illinois, Dept Mech Sci & Engn, Urbana, IL 61801 USA

[3] Univ Illinois, Dept Elect & Comp Engn, Urbana, IL 61801 USA

[4] Univ Illinois, Dept Chem, Urbana, IL 61801 USA

[5] Univ Illinois, Beckman Inst Adv Sci & Technol, Urbana, IL 61801 USA

[6] Univ Illinois, Mat Res Lab, Urbana, IL 61801 USA

[7] Sandia Natl Labs, Albuquerque, NM 87185 USA

来源：

NANO LETTERS | 2008年 / 8卷 / 08期

关键词：

D O I：

10.1021/nl080841k

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We describe the fabrication of unusual classes of three-dimensional (3D) nanostructures using single step, two-photon exposures of photopolymers through elastomeric phase masks with 5-fold, Penrose quasicrystalline layouts. Confocal imaging, computational studies, and 3D reconstructions reveal the essential aspects of the flow of light through these quasicrystal masks. The resulting nanostructures show interesting features, including quasicrystalline layouts in planes parallel to the sample surfaces, with completely aperiodic variations through their depths, consistent with the optics. Spectroscopic measurements of transmission and reflection provide additional insights.

引用

页码：2236 / 2244

页数：9

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