Deposition of PZT thin film and determination of their optical properties

被引：10

作者：

Czekaj, D

Gomes, MJM

Vasilevskiy, M

Pereira, M

Dos Santos, MP

机构：

[1] Univ Minho, Dept Phys, P-4719 Braga, Portugal

[2] Silesian Univ, Dept Ceram Mat & Tribol, PL-41200 Sosnowiec, Poland

来源：

JOURNAL OF THE EUROPEAN CERAMIC SOCIETY | 1999年 / 19卷 / 6-7期

关键词：

RF magnetron sputtering; films; X-ray methods; optical properties; PZT;

D O I：

10.1016/S0955-2219(98)00461-0

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The RF magnetron sputtering technique was applied for the thin film deposition. Hot-pressed PZT ceramics doped mainly with Bi and Ge were used as a target. The PZT thin films were grown on different substrates (Si, stainless steel and glass) and the sputtering parameters were optimised to assure the composition transfer between the target and the thin film. The obtained samples were analysed first as made and then after post deposition annealing. Structure of the films was investigated by X-ray diffraction. Optical properties of the thin films were investigated by: (i) linear absorption method and (ii) Raman scattering. Results of the modelling of the optical spectra for the PZT films on glass substrates are also reported. (C) 1999 Elsevier Science Limited. All rights reserved.

引用

页码：1489 / 1492

页数：4

共 16 条

[1] DEPOSITION OF FERROELECTRIC PZT THIN-FILMS BY PLANAR MULTITARGET SPUTTERING [J].